Advanced Ta-based diffusion barriers for Cu interconnects

Bibliographic Details
Main Author: Hübner, René.
Format: Electronic
Language:English
Published: New York : Nova Science Publishers, c2009.
Subjects:
Online Access:View fulltext via EzAccess
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245 1 0 |a Advanced Ta-based diffusion barriers for Cu interconnects  |c René Hübner.  |h [electronic resource] / 
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504 # # |a Includes bibliographical references (p. [73]-86) and index. 
588 # # |a Description based on print version record. 
650 # 0 |a Interconnects (Integrated circuit technology) 
650 # 0 |a Integrated circuits. 
650 # 0 |a Electrodiffusion. 
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650 # 7 |a TECHNOLOGY & ENGINEERING  |x Circuits  |x General.  |x Electronics  |2 bisacsh 
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