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01879cam a2200433Ia 4500 |
001 |
2220 |
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OCoLC |
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20130711001119.0 |
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m o d |
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cr cnu---unuuu |
008 |
090811s2009 nyua ob 001 0 eng d |
020 |
# |
# |
|a 9781607416753 (electronic bk.)
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020 |
# |
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|a 1607416751 (electronic bk.)
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029 |
1 |
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|a AU@
|b 000051428605
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035 |
# |
# |
|a (OCoLC)429997761
|
040 |
# |
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|a N$T
|b eng
|c N$T
|d OCLCQ
|d MYPMP
|d OCLCQ
|d YDXCP
|
049 |
# |
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|a MYTA
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050 |
# |
4 |
|a TK7874.53
|b .H83 2009eb
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072 |
# |
7 |
|a TEC
|x 008020
|2 bisacsh
|
072 |
# |
7 |
|a TEC
|x 008010
|2 bisacsh
|
082 |
0 |
4 |
|a 621.3815
|2 22
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100 |
1 |
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|a Hübner, René.
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1 |
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|a Advanced Ta-based diffusion barriers for Cu interconnects
|c René Hübner.
|h [electronic resource] /
|
260 |
# |
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|a New York :
|b Nova Science Publishers,
|c c2009.
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300 |
# |
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|a 1 online resource (93 p.) :
|b ill.
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504 |
# |
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|a Includes bibliographical references (p. [73]-86) and index.
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588 |
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|a Description based on print version record.
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650 |
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0 |
|a Interconnects (Integrated circuit technology)
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650 |
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|a Integrated circuits.
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650 |
# |
0 |
|a Electrodiffusion.
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650 |
# |
7 |
|a TECHNOLOGY & ENGINEERING
|x Circuits
|x Integrated.
|x Electronics
|2 bisacsh
|
650 |
# |
7 |
|a TECHNOLOGY & ENGINEERING
|x Circuits
|x General.
|x Electronics
|2 bisacsh
|
655 |
# |
4 |
|a Electronic books.
|
655 |
# |
7 |
|a Electronic books.
|2 local
|
776 |
0 |
8 |
|a Hübner, René.
|d New York : Nova Science Publishers, c2009
|i Print version:
|t Advanced Ta-based diffusion barriers for Cu interconnects.
|w (OCoLC)192082716
|w (DLC) 2008008583
|z 1604564512
|z 9781604564518
|
856 |
4 |
0 |
|u https://ezaccess.library.uitm.edu.my/login?url=http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=281179
|z View fulltext via EzAccess
|
938 |
# |
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|a EBSCOhost
|b EBSC
|n 281179
|
938 |
# |
# |
|a YBP Library Services
|b YANK
|n 3084112
|
999 |
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# |
|z 635090427501196915
|