Description: Advanced Ta-based diffusion barriers for Cu interconnects

Bibliographic Details
Main Author:	Hübner, René.
Format:	Electronic
Language:	English
Published:	New York : Nova Science Publishers, c2009.
Subjects:	Interconnects (Integrated circuit technology) Integrated circuits. Electrodiffusion. TECHNOLOGY & ENGINEERING > Circuits > Integrated. > Electronics TECHNOLOGY & ENGINEERING > Circuits > General. > Electronics Electronic books.
Online Access:	View fulltext via EzAccess

Description
Physical Description:	1 online resource (93 p.) : ill.
Bibliography:	Includes bibliographical references (p. [73]-86) and index.
ISBN:	9781607416753 (electronic bk.) 1607416751 (electronic bk.)