Nanoimprint Lithography: An Enabling Process for Nanofabrication

• Main Author: Zhou, Weimin. (Author)
• Corporate Author: SpringerLink (Online service)
• Format: Electronic
• Language: English
• Published: Berlin, Heidelberg : Springer Berlin Heidelberg : Imprint: Springer, 2013.
• Subjects: Engineering.; Nanochemistry.; Optical materials.; Nanotechnology.; Nanotechnology and Microengineering.; Optical and Electronic Materials.
• Online Access: https://ezaccess.library.uitm.edu.my/login?url=http://dx.doi.org/10.1007/978-3-642-34428-2

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...

Table of Contents:

• Principles and statues of nanoimprint lithography
• Stamp Fabrication
• stamp surface treatment
• Nanoimprint lithography resists
• Nanoimprint lithography process
• Modeling and Simulation of NIL
• Application of NIL in Light emitting Diodes
• Application of NIL in memory devices
• Application of NIL in solar cell.